Precise Blaze Angle Measurements of Lithographically Fabricated Silicon Immersion Gratings

Silicon immersion gratings and grisms enable compact, near-infrared spectrographs with high throughput. These instruments find use in ground-based efforts to characterize stellar and exoplanet atmospheres, and in space-based observatories. Our grating fabrication technique uses x-ray crystallography to orient silicon parts prior to cutting, followed by lithography and wet chemical etching to produce the blaze. This process takes advantage of the crystal structure and relative difference in etching rates between the (100) and (111) planes such that we can produce parts that have surface errors < lambda/4. Previous measurements indicate that chemical etching can yield a final etched blaze that slightly differs from the orientation of the (111) plane. This difference can be corrected by the mechanical mount in the case of the immersion gratings, but doing so may compromise grating throughput. In the case of the grisms, failure to take the actual blaze into account will alter the wavelength of the undeviated array. We report on multiple techniques to precisely measure the blaze of our in-house fabricated immersion gratings. The first method uses a scanning electron microscope to image the blaze profile, which yields a measurement precision of 0.5 degrees. The second method is an optical method of measuring the angle between blaze faces using a rotation stage, which yields a measurement precision of 0.2 degrees. Finally, we describe a theoretical blaze function modeling method, which we expect to yield a measurement precision of 0.1 degrees. With these methods, we can quantify the accuracy with which the wet etching produces the required blaze and further optimize grating and grism efficiencies.