Internal gettering efficiency in p/p+ and p/p- silicon epistructures

被引:1
|
作者
Frigeri, C
Borionetti, G
Godio, P
Gombia, E
机构
[1] CNR, IMEM Inst, IT-43010 Parma, Italy
[2] MEMC Elect Mat SpA, IT-28100 Novara, Italy
关键词
Cz Si; EBIC; iron; gettering; oxygen precipitates; p(+) doping;
D O I
10.4028/www.scientific.net/SSP.95-96.593
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The efficiency of internal gettering vs. external and p(+) gettering has been investigated by EBIC contrast measurements in p/p(+) and p/p(-) epi Si on Cz substrates containing oxygen precipitates. The samples were not intentionally contaminated. It was seen that internal gettering also works in presence of back-side poly Si and high B concentration (p/p+ samples with high oxygen content and back-side poly Si) because of, on one hand, the high density of oxygen precipitates and, on the other hand, the low onset temperature for p(+) gettering. The metal undergoing internal gettering likely is Fe, though present in concentrations as low as 10(9)-10(10) cm(-3).
引用
收藏
页码:593 / 598
页数:6
相关论文
共 50 条
  • [1] Dominant iron gettering mechanism in p/p+ silicon wafers
    Lin, W
    Benton, JL
    Pinacho, R
    Ramappa, DA
    Henley, W
    APPLIED PHYSICS LETTERS, 2000, 77 (02) : 241 - 243
  • [2] The photoluminescence study of p-/p+ type porous silicon
    Sun, L
    Zhang, SL
    Zhang, L
    Guan, XD
    Han, RQ
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1998, 17 (19) : 1649 - 1651
  • [3] Gettering of copper and nickel in p/p+ epitaxial wafers
    Hoelzl, R
    Huber, D
    Range, KJ
    Fabry, L
    Hage, J
    Wahlich, R
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2000, 147 (07) : 2704 - 2710
  • [4] Impact of cooling rate in annealing for iron gettering in p/p+ silicon device wafers
    Horikawa, M
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2000, 3 (07) : 343 - 345
  • [5] Efficiency of boron gettering for iron impurities in p/p(+) epitaxial silicon wafers
    Miyazaki, M
    Miyazaki, S
    Ogushi, S
    Ochiai, T
    Sano, M
    Shigematsu, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1997, 36 (4A): : L380 - L381
  • [6] Dislocation nucleation study in p/p+ silicon
    Feichtinger, P
    Goorsky, MS
    Oster, D
    D'Silva, T
    Moreland, J
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2001, 148 (07) : G379 - G382
  • [7] RECOMBINATION LIFETIME OF P/P+ EPITAXIAL SILICON
    AMINZADEH, M
    FORBES, L
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (08) : C374 - C374
  • [8] Iron solubility in boron-doped silicon and Fe gettering mechanism in p/p+ epitaxial wafers
    Shabani, MB
    Shiina, Y
    Shimanuki, S
    Kirscht, FG
    GETTERING AND DEFECT ENGINEERING IN SEMICONDUCTOR TECHNOLOGY, 2002, 82-84 : 331 - 339
  • [9] Competitive Interaction between Segregation Gettering and Surface Precipitation of Nickel in p/p+ Silicon Epitaxial Wafers
    Torigoe, Kazuhisa
    Ono, Toshiaki
    Nakamura, Kozo
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2015, 4 (09) : Q110 - Q114
  • [10] Modular transformations and Verlinde formulae for logarithmic (p+, p-)-models
    Ridout, David
    Wood, Simon
    NUCLEAR PHYSICS B, 2014, 880 : 175 - 202