Optimization of a Si gradient in laminated SiFe alloys

被引:3
|
作者
Dupré, L
Vandenbossche, L
Sergeant, P
Houbaert, Y
Van Keer, R
Melkebeek, J
机构
[1] State Univ Ghent, Dept Elect Energy Syst & Automat, B-9000 Ghent, Belgium
[2] State Univ Ghent, Dept Met & Mat Sci, B-9052 Ghent, Belgium
[3] State Univ Ghent, Dept Numer Anal, B-9000 Ghent, Belgium
关键词
numerical simulation; electrical steel; eddy currents; loss;
D O I
10.1016/j.jmmm.2004.11.557
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper, we discuss the possibilities to improve the magnetic properties of low Si wt% laminated electrical steels by introducing a Si- gradient during a diffusion process. It is shown that a numerical model, based on Preisach theory, magnetic field computations and a genetic algorithm, allows us to optimize a Si gradient throughout the thickness of SiFe laminations. The low Si grade combined with an introduced Si gradient approaches quite well the beneficial magnetic properties of the massive high Si grade. During the numerical evaluations, the electrical conductivity as well as the hysteresis properties are adapted as a function of the local Si wt% according to experimental results. © 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:1491 / 1494
页数:4
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