Electrical Performances of InN/GaN Tunneling Field-Effect Transistor

被引:1
|
作者
Cho, Min Su [1 ]
Kwon, Ra Hee [1 ]
Seo, Jae Hwa [1 ]
Yoon, Young Jun [1 ]
Jang, Young In [1 ]
Won, Chul-Ho [1 ]
Kim, Jeong-Gil [1 ]
Lee, Junsoo [2 ]
Cho, Seongjae [2 ]
Lee, Jung-Hee [1 ]
Kang, In Man [1 ]
机构
[1] Kyungpook Natl Univ, Sch Elect Engn, 80 Daehak Ro, Daegu 41566, South Korea
[2] Gachon Univ, Dept Elect Engn, 1342 Seongnamdaero, Seongnam Si 13120, Gyeonggi Do, South Korea
基金
新加坡国家研究基金会;
关键词
InN/GaN; Gallium Nitride; Double Gate; Field-Effect Transistor; Power Device; III-Nitride Heterojunction; MOBILITY TRANSISTORS; GAN;
D O I
10.1166/jnn.2017.15134
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
In this paper, we design and analyze the InN/GaN double-gate (DG) tunneling field-effect transistor (TFET) with very steep switching and superb DC and RF characteristics. The proposed device is closely investigated in terms of both DC and RF performances including I-on, I-off, on/off current ratio (I-on/I-off), subthreshold swing (S), cut-off frequency (f(t)), maximum oscillating frequency (f(max)), and Johnson's figure of merit (JFOM) using TCAD simulation. The proposed InN/GaN TFET shows high current drivability, extremely suppressed I-off, and higly sharp switching owing to the effects by the electron well formed by the control gate (CG) in the InN layer. The InN/GaN TFET having a channel length (L-ch) of 50 nm demonstrated maximum I-on = 3.5 mA/mu m, extremely low I-off = 1 x 10(-21) A/mu m, minimum S of 8.8 mV/dec, and the maximum values of f(t) and f(max) are obtained as 100 GHz and 5.5 THz, respectively. In order to confirm the high performances of the devices in the RF operation, JFOM has been calculated and the value extracted from an optimally designed InN/GaN TFET is 1.7 THz.V.
引用
收藏
页码:8355 / 8359
页数:5
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