Influence of Ion Beam Bombardment on Surface Roughness of K9 Glass Substrate

被引:0
|
作者
Pan Yongqiang [1 ]
Huang Guojun [1 ]
Hang Lingxia [1 ]
机构
[1] Xian Technol Univ, Shaanxi Prov Thin Film Technol & Opt Test Open Ke, Xian 710032, Peoples R China
关键词
optical surface roughness; ion beam bombardment; Talysurf CCI;
D O I
10.1117/12.866134
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ion beam bombardment optical substrate surface has become an important part of process of optical thin films deposition. In this work, the K9 optical glass is bombarded by the broad beam cold cathode ion source. The dependence of the K9 glass surface roughness on the ion beam bombardment time, the ion energy, the distance and incident angle are all investigated, respectively. Surface roughness of K9 glass is measured using Talysurf CCI. The experimental results show that when the ion energy is 800ev, the bombardment distance of 20cm, with the ion beam bombardment time increased, the K9 substrate surface roughness first increase and then decrease. When the ion beam bombardment distance is 20cm, bombardment time is 10min, with the bombardment energy increases, substrate surface roughness increase first and then decrease, especially in the ion energy greater than 1200ev, the optical substrate surface roughness rapidly increases. When the ion energy is 800 eV, bombardment time is 10min, with the bombardment distance increase, substrate surface roughness decrease gradually. Furthermore, the incident angle of ion beam plays an important role in improving the K9 glass surface roughness.
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页数:5
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