Ultra-High Resistance Measurement Based on Non-Contact Electrostatic Voltmeter

被引：0
|
作者：
Lin, Feipeng [1 ]
Li, Chuansheng [1 ]
Liang, Bo [1 ]
Shao, Haiming [1 ]
机构：
[1] Natl Inst Metrol, Beijing, Peoples R China
来源：
2016 CONFERENCE ON PRECISION ELECTROMAGNETIC MEASUREMENTS (CPEM 2016) | 2016年
关键词：
Ultra-High resistance; non-contact voltage measurement; dual-source high resistor bridge; electrostatic voltmeter; measurement uncertainty;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In order to overcome the drawback that the measurement uncertainty of the ultra-high resistance over 10(14) Omega may be deteriorated severely due to insufficient resolution of the electrometer in conventional scheme, a novel method based on the dual sources high resistance bridge and non-contact voltage measurement is presented. The measurement uncertainty is largely dependent on the standard resistance and determined by the resolution of the electrostatic voltmeter. It is shown by the experimental results that the measurement uncertainty for the resistance of 100 T Omega to 1000 T Omega is better than 0.2%, k = 2.
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页数：2
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