A New High-Density 10T CMOS Gate-Array Base Cell for Two-Port SRAM Applications

被引:0
|
作者
Shibata, Nobutaro [1 ]
Gotoh, Yoshinori [1 ]
Ishihara, Takako [1 ]
机构
[1] NTT Corp, NTT Microsyst Integrat Labs, Atsugi, Kanagawa 2430198, Japan
来源
IEICE TRANSACTIONS ON ELECTRONICS | 2016年 / E99C卷 / 06期
关键词
10T type; bitline capacitance; CMOS; gate array; high speed; low power; memory-oriented base cell; shared contact; two-port SRAM;
D O I
10.1587/transele.E99.C.717
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Two-port SRAMs are frequently installed in gate-array VLSIs to implement smart functions. This paper presents a new high-density 10T CMOS base cell for gate-array-based two-port SRAM applications. Using the single base cell alone, we can implement a two-port memory cell whose bitline contacts are shared with the memory cell adjacent to one of two dedicated sides, resulting in greatly reduced parasitic capacitance in bitlines. To throw light on the total performance derived from the base cell, a plain two-port SRAM macro was designed and fabricated with a 0.35-mu m low cost, logic process. Each of two 10-bit power-saved address decoders was formed with 36% fewer base cells by employing complex gates and a subdecoder. The new sense amplifier with a complementary sensing scheme had a fine sensitivity of 35 mV(pp), and so we successfully reduced the required read bitline signal from 250 to 70 mV(pp). With the macro with 1024 memory cells per bitline, the address access time under typical conditions of a 2.5-V power supply and 25 degrees C was 4.0 ns (equal to that obtained with full-custom style design) and the power consumption at 200-MHz simultaneous operations of two ports was 6.7 mW for an I/O-data width of 1 bit.
引用
收藏
页码:717 / 726
页数:10
相关论文
共 15 条
  • [1] A 10T non-precharge two-port SRAM reducing readout power for video processing
    Noguchi, Hiroki
    Iguchi, Yusuke
    Fujiwara, Hidehiro
    Okumura, Shunsuke
    Morita, Yasuhiro
    Nii, Koji
    Kawaguchi, Hiroshi
    Yoshimoto, Masahiko
    IEICE TRANSACTIONS ON ELECTRONICS, 2008, E91C (04) : 543 - 552
  • [2] A 10T non-precharge two-port SRAM for 74% power reduction in video processing
    Noguchi, Hiroki
    Iguchi, Yusuke
    Fujiwara, Hidehiro
    Morita, Yasuhiro
    Nii, Koji
    Kawaguchi, Hiroshi
    Yoshimoto, Masahiko
    IEEE COMPUTER SOCIETY ANNUAL SYMPOSIUM ON VLSI, PROCEEDINGS: EMERGING VLSI TECHNOLOGIES AND ARCHITECTURES, 2007, : 107 - +
  • [3] High-Density RAM/ROM Macros Using CMOS Gate-Array Base Cells: Hierarchical Verification Technique for Reducing Design Cost
    Shibata, Nobutaro
    Gotoh, Yoshinori
    IEEE TRANSACTIONS ON VERY LARGE SCALE INTEGRATION (VLSI) SYSTEMS, 2015, 23 (08) : 1415 - 1428
  • [4] A low power Schmitt-trigger driven 10T SRAM Cell for high speed applications
    Soni, Lokesh
    Pandey, Neeta
    INTEGRATION-THE VLSI JOURNAL, 2024, 97
  • [5] Design of 32 x 32 (1 KB) SRAM array using 10T SRAM cell for portable low power biomedical applications
    Kumar, Appikatla Phani
    Lorenzo, Rohit
    ANALOG INTEGRATED CIRCUITS AND SIGNAL PROCESSING, 2025, 123 (02)
  • [6] Low-Power Near-Threshold 10T SRAM Bit Cells With Enhanced Data-Independent Read Port Leakage for Array Augmentation in 32-nm CMOS
    Gupta, Shourya
    Gupta, Kirti
    Calhoun, Benton H.
    Pandey, Neeta
    IEEE TRANSACTIONS ON CIRCUITS AND SYSTEMS I-REGULAR PAPERS, 2019, 66 (03) : 978 - 988
  • [7] A novel two-port 6T CMOS SRAM cell structure for low-voltage VLSI SRAM with single-bit-line simultaneous read-and-write access (SBLSRWA) capability
    Wang, BT
    Kuo, JB
    ISCAS 2000: IEEE INTERNATIONAL SYMPOSIUM ON CIRCUITS AND SYSTEMS - PROCEEDINGS, VOL V: EMERGING TECHNOLOGIES FOR THE 21ST CENTURY, 2000, : 733 - 736
  • [8] Vertical ferroelectric thin-film transistor array with a 10-nm gate length for high-density three-dimensional memory applications
    Kim, Ik-Jyae
    Kim, Min-Kyu
    Lee, Jang-Sik
    Applied Physics Letters, 2022, 121 (04):
  • [9] Vertical ferroelectric thin-film transistor array with a 10-nm gate length for high-density three-dimensional memory applications
    Kim, Ik-Jyae
    Kim, Min-Kyu
    Lee, Jang-Sik
    APPLIED PHYSICS LETTERS, 2022, 121 (04)
  • [10] A New High-Density Twin-Gate Isolation One-Time Programmable Memory Cell in Pure 28-nm CMOS Logic Process
    Hsiao, Woan Yun
    Peng, Ping Chun
    Chang, Tzong-Sheng
    Chih, Yu-Der
    Tsai, Wu-Chin
    Chang, Meng-Fan
    Chien, Tun-Fei
    King, Ya-Chin
    Lin, Chrong-Jung
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2015, 62 (01) : 121 - 127