Mirror-Symmetric Patterning of Topological Insulator Reverses Photogalvanic Currents

被引：0
|
作者：
Sun, Xinxing [1 ]
Adamo, Giorgio [1 ]
Eginligil, Mustafa [2 ,5 ]
Krishnamoorthy, Harish N. S. [1 ]
Zheludev, Nikolay, I [1 ,2 ,3 ,4 ]
Soci, Cesare [1 ,2 ]
机构：
[1] Nanyang Technol Univ, Ctr Disrupt Photon Technol, SPMS, TPI, Singapore 637371, Singapore
[2] Nanyang Technol Univ, Div Phys & Appl Phys, Singapore 637371, Singapore
[3] Univ Southampton, Optoelect Res Ctr, Southampton SO17 1BJ, Hants, England
[4] Univ Southampton, Ctr Photon Metamat, Southampton SO17 1BJ, Hants, England
[5] Nanjing Tech Univ Nanjing Tech, 30 South Puzhu Rd, Nanjing 211816, Peoples R China
来源：
2021 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2021年
关键词：
D O I：
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Patterning of topological insulator with mirror-symmetric forms of planar chiral design yields photogalvanic currents with opposite directions due to the interplay between the spin-momentum locking and polarization conversion in the pattern. (c) 2021 The Author(s)
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页数：2
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