Thermogravimetric analysis and microstructural observations on the formation of GaN from the reaction between Ga2O3 and NH3

被引:21
|
作者
Kiyono, Hajime [1 ]
Sakai, Toshiki [1 ]
Takahashi, Mari [1 ]
Shimada, Shiro [1 ]
机构
[1] Hokkaido Univ, Grad Sch Engn, Sapporo, Hokkaido 0608628, Japan
关键词
Growth models; Growth from vapor; Nitrides; GALLIUM NITRIDE; VAPOR-PHASE; CRYSTALS; POWDERS; MECHANISM; AMMONIA; EPITAXY; GROWTH; OXIDE;
D O I
10.1016/j.jcrysgro.2010.06.021
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Thermogravimetric analysis (TGA) and microstructural observations were carried to investigate the nitridation mechanism of beta-Ga2O3 powder to GaN under an NH3/Ar atmosphere. Non-isothermal TGA showed that nitridation of beta-Ga2O3 starts at similar to 650 degrees C, followed by decomposition of GaN at similar to 1100 degrees C. Isothermal TGA showed that nitridation follows linear kinetics in the temperature range 800-1000 degrees C. At an early stage of nitridation, small GaN particles (similar to 5 nm) are deposited on the beta-Ga2O3 crystal surface and they increase with time. We proposed a mechanism for the nitridation of Ga2O3 by NH3 whereby nitridation of beta-Ga2O3 proceeds via the intermediate vapor species Ga2O(g). (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:2823 / 2827
页数:5
相关论文
共 50 条
  • [1] Influence of NH3 gas for GaN epilayer on β-Ga2O3 substrate by nitridation
    Lee, H. J.
    Shin, T. I.
    Yoon, D. H.
    SURFACE & COATINGS TECHNOLOGY, 2008, 202 (22-23): : 5497 - 5500
  • [2] Fabrication of hexagonal GaN on the surface of βGa2O3 single crystal by nitridation with NH3
    Ohira, S
    Yoshioka, M
    Sugawara, T
    Nakajima, K
    Shishido, T
    THIN SOLID FILMS, 2006, 496 (01) : 53 - 57
  • [3] Reconstruction of the β-Ga2O3 (100) cleavage surface to hexagonal GaN after NH3 nitridation
    Víllora, EG
    Shimamura, K
    Aoki, K
    Ichinose, N
    JOURNAL OF CRYSTAL GROWTH, 2004, 270 (3-4) : 462 - 468
  • [4] Controllable nitrogen doping of MOCVD Ga2O3 using NH3
    Alema, Fikadu
    Itoh, Takeki
    Brand, William
    Osinsky, Andrei
    Speck, James S.
    APPLIED PHYSICS LETTERS, 2023, 122 (25)
  • [5] Study on sensing characteristics of NH3 on (-201) β-Ga2O3 surface
    He, Xiaomin
    Wang, Meng
    Hu, Jichao
    JOURNAL OF CRYSTAL GROWTH, 2023, 603
  • [6] Growth of GaN nanowires by direct reaction of Ga with NH3
    He, MQ
    Zhou, PZ
    Mohammad, SN
    Harris, GL
    Halpern, JB
    Jacobs, R
    Sarney, WL
    Salamanca-Riba, L
    JOURNAL OF CRYSTAL GROWTH, 2001, 231 (03) : 357 - 365
  • [7] DC and RF analysis of ScAlN/GaN/β-Ga2O3 and ScAlN/InGaN/GaN/β-Ga2O3 HEMTs on SiC substrate
    Jagadesh, M.
    Karthikeyan, A.
    Somasundaram, Devaraj
    MICROELECTRONICS JOURNAL, 2024, 152
  • [8] Preparation of GaN powder by mechanochemical reaction between Ga2O3 and Li3N
    Kano, Junya
    Kobayashi, Eiko
    Tongamp, William
    Saito, Fumlo
    JOURNAL OF ALLOYS AND COMPOUNDS, 2008, 464 (1-2) : 337 - 339
  • [9] Homoepitaxial growth of a-plane GaN layers by reaction between Ga2O vapor and NH3 gas
    Sumi, Tomoaki
    Taniyama, Yuuki
    Takatsu, Hiroaki
    Juta, Masami
    Kitamoto, Akira
    Imade, Mamoru
    Yoshimura, Masashi
    Isemura, Masashi
    Mori, Yusuke
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2015, 54 (06)
  • [10] A Performance Comparison Between β-Ga2O3 and GaN HEMTs
    Kumar, Sandeep
    Soman, Rohith
    Pratiyush, Anamika Singh
    Muralidharan, Rangarajan
    Nath, Digbijoy N.
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2019, 66 (08) : 3310 - 3317