Influence of charged walls and defects on DC resistivity and dielectric relaxations in Cu-Cl boracite

被引:0
|
作者
Cochard, C. [1 ,4 ]
Granzow, T. [2 ]
Fernandez-Posada, C. M. [3 ,6 ]
Carpenter, M. A. [3 ]
McQuaid, R. G. P. [4 ]
Guy, J. G. M. [4 ]
Whatmore, R. W. [5 ]
Gregg, J. M. [4 ]
机构
[1] Univ Dundee, Sch Sci & Engn, Dundee DD1 4HN, Scotland
[2] Luxembourg Inst Sci & Technol LIST, MRT Dept, L-4362 Esch Sur Alzette, Luxembourg
[3] Univ Cambridge, Dept Earth Sci, Downing St, Cambridge CB2 3EQ, England
[4] Queens Univ Belfast, Sch Math & Phys, Belfast BT7 1NN, Antrim, North Ireland
[5] Imperial Coll London, Fac Engn, Dept Mat, London SW7 2AZ, England
[6] Univ Cambridge, Maxwell Ctr, Cavendish Lab, Cambridge, England
基金
英国工程与自然科学研究理事会;
关键词
DOMAIN-WALLS;
D O I
10.1063/5.0067846
中图分类号
O59 [应用物理学];
学科分类号
摘要
Charged domain walls form spontaneously in Cu-Cl boracite on cooling through the phase transition. These walls exhibit changed conductivity compared to the bulk and motion consistent with the existence of negative capacitance. Here, we present the dielectric permittivity and DC resistivity of bulk Cu-Cl boracite as a function of temperature (-140 to 150 & DEG;C) and frequency (1 mHz to 10 MHz). The thermal behavior of the two observed dielectric relaxations and the DC resistivity is discussed. We propose that the relaxations can be explained by the existence of point defects, most likely local complexes created by a change of valence of Cu and accompanying oxygen vacancies. In addition, the sudden change in resistivity seen at the phase transition suggests that conductive domain walls contribute significantly to the conductivity in the ferroelectric phase.
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页数:6
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