Enhancing exposure depth for surface-plasmon polaritons interference nanolithography by waveguide modulation

被引：3

作者：

Wang, Jing-Quan ^{[1
]}

Liang, Hui-Min ^{[2
]}

Niu, Xiao-Yun ^{[1
]}

Du, Jing-Lei ^{[1
]}

Ye, Song ^{[1
]}

Zhang, Zhi-You ^{[1
]}

机构：

[1] Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China

[2] Hebei Univ Engn, Coll Sci, Handan 056038, Hebei, Peoples R China

来源：

JOURNAL OF APPLIED PHYSICS | 2010年 / 108卷 / 01期

基金：

中国国家自然科学基金;

关键词：

LITHOGRAPHY; MODES;

D O I：

10.1063/1.3330697

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A maskless interference device with a waveguide coated thin metal film is investigated for surface-plasmon polaritons interference lithography (SPPIL) in this paper. The focal depth of interference fringes in the resist is modulated obviously by the thicknesses of the waveguide and the metal film, which will solve the question of short exposure depth for conventional SPPIL, and improve the practicability of SPPIL. Simulated and analyzed results demonstrated that the focal depth of interference fringes is increased dramatically with suitable parameters for the structure. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3330697]

引用

页数：3

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