Structural properties of GaN1-xPx films

被引:9
|
作者
Chen, DJ [1 ]
Shen, B [1 ]
Zhang, KX [1 ]
Deng, YZ [1 ]
Fan, J [1 ]
Zhang, R [1 ]
Shi, Y [1 ]
Zheng, YD [1 ]
机构
[1] Nanjing Univ, Dept Phys, Nanjing 210093, Peoples R China
关键词
GaN1-xPx; metal-organic chemical vapor deposition; x-ray diffraction; Raman spectra;
D O I
10.7498/aps.52.1788
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
X-ray diffraction (XRD) and Raman spectra for a series of high-phosphorus-content GaN1-xPx films, with phosphorus content up to 15%, grown by means of light-radiation heating, low-pressure metal-organic chemical vapor deposition have been investigated. XRD results show that (0002) peaks of GaN1-xPx. samples have shifted to smaller angles compared with that of undoped GaN sample. The Raman spectra of GaN, P. films exhibit four new vibrational modes compared with undoped GaN sample. These modes are assigned to gap modes related to the Ga-P bond vibrations, local vibrational mode related to the phosphorus clusters, and disorder-activated scattering, respectively. The frequency of the A(1) (LO) mode is found to decrease with increasing x. This redshift is attributed to the effects of alloying and strain.
引用
收藏
页码:1788 / 1791
页数:4
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