Formation of regular nanoscale undulations on a thin polymer film imprinted by a soft mold

被引：11
|
作者：
Suh, KY [1 ]
Seo, SM
Yoo, PJ
Lee, HH
机构：
[1] Seoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South Korea
[2] Seoul Natl Univ, Sch Chem & Biol Engn, Seoul 151742, South Korea
来源：
JOURNAL OF CHEMICAL PHYSICS | 2006年 / 124卷 / 02期
关键词：
D O I：
10.1063/1.2150211
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
We observed the formation of regular nanoscale undulations on a polystyrene film when imprinted by a soft poly(dimethylsiloxane) mold above the polymer's glass transition temperature. The shape of the wave was reminiscent of a buckling wave frequently observed for a metal film supported on an elastomeric substrate. We derived a simple theoretical model based on an anisotropic buckling of the polymer film rigidly bound to a substrate, which agrees well with the experiment. (c) 2006 American Institute of Physics.
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页码：1 / 5
页数：5
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