Double layer capacitance on a rough metal surface: Surface roughness measured by ''Debye ruler''

被引:0
|
作者
Daikhin, LI
Kornyshev, AA
Urbakh, MI
机构
[1] TEL AVIV UNIV, SCH CHEM, IL-69978 TEL AVIV, ISRAEL
[2] FORSCHUNGSZENTRUM JULICH, FORSCHUNGSZENTRUM, LEV, D-52425 JULICH, GERMANY
关键词
D O I
暂无
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
引用
收藏
页码:4 / COLL
相关论文
共 50 条
  • [1] Double layer capacitance on a rough metal surface: surface roughness measured by ''Debye ruler''
    Daikhin, LI
    Kornyshev, AA
    Urbakh, M
    ELECTROCHIMICA ACTA, 1997, 42 (19) : 2853 - 2860
  • [2] Double-layer capacitance on a rough metal surface
    Daikhin, LI
    Kornyshev, AA
    Urbakh, M
    PHYSICAL REVIEW E, 1996, 53 (06): : 6192 - 6199
  • [3] Effect of Surface Roughness on the Metal Surface Stress Layer
    Wang, Xiangyu
    Zhang, Linlin
    Li, Xiaoyang
    2016 3RD INTERNATIONAL CONFERENCE ON SMART MATERIALS AND NANOTECHNOLOGY IN ENGINEERING (SMNE 2016), 2016, : 126 - 128
  • [4] Double-layer capacitance for a charged surface
    Warmbier, Robert
    Malaza, Nkosinathi
    Quandt, Alexander
    IONICS, 2017, 23 (02) : 331 - 335
  • [5] Double-layer capacitance for a charged surface
    Robert Warmbier
    Nkosinathi Malaza
    Alexander Quandt
    Ionics, 2017, 23 : 331 - 335
  • [6] Probing the Debye Layer: Capacitance and Potential of Zero Charge Measured Using a Debye-Layer Transistor
    Fraikin, J. -L.
    Requa, M. V.
    Cleland, A. N.
    PHYSICAL REVIEW LETTERS, 2009, 102 (15)
  • [7] POLARIZATION CAPACITANCE DETERMINATIONS OF SURFACE ROUGHNESS
    TURPIN, MR
    TESTERMAN, MK
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (02) : 168 - 170
  • [8] Effect of the surface roughness on the detecting capacitance
    Zhang, Haifeng
    Liu, Xiaowei
    Li, Hai
    Chen, Nan
    Fu, Yibo
    MICRO-NANO TECHNOLOGY XIV, PTS 1-4, 2013, 562-565 : 1461 - +
  • [9] Impact of the surface roughness on the electrical capacitance
    Albina, A.
    Taberna, P. L.
    Cambronne, J. P.
    Simon, P.
    Flahaut, E.
    Lebey, T.
    MICROELECTRONICS JOURNAL, 2006, 37 (08) : 752 - 758
  • [10] Correlation between inversion layer mobility and surface roughness measured by AFM
    Yamanaka, T
    Fang, SJ
    Lin, HC
    Snyder, JP
    Helms, CR
    IEEE ELECTRON DEVICE LETTERS, 1996, 17 (04) : 178 - 180