Growth of GaMnAs under near-stoichiometric conditions

被引:22
|
作者
Avrutin, V
Humienik, D
Frank, S
Koeder, A
Schoch, W
Limmer, W
Sauer, R
Waag, A
机构
[1] Univ Ulm, Abt Halbleiterphys, D-89069 Ulm, Germany
[2] Tech Univ Braunschweig, Inst Halbleitertech, D-38103 Braunschweig, Germany
关键词
D O I
10.1063/1.1991971
中图分类号
O59 [应用物理学];
学科分类号
摘要
We studied the effect of the V/III flux ratio and substrate temperature on magnetotransport properties and lattice parameters of Ga0.96Mn0.04As grown by molecular-beam epitaxy. For all the substrate temperatures, the conductivities and Curie temperatures of the layers were found to increase as the V/III flux ratio approaches 1. A Curie temperature as high as 95 K was achieved for the Ga0.96Mn0.04As samples grown at 240 degrees C and a V/III ratio of about 1.5. The lattice parameter of Ga0.96Mn0.04As increased with decreasing V/III ratio and/or increasing growth temperature. Possible reasons for the effect of the V/III ratio on the magnetotransport properties and lattice parameter of GaMnAs are discussed. (c) 2005 American Institute of Physics.
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页数:4
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