Large crystals on Cu film surfaces irradiated by a glow discharge plasma

被引:0
|
作者
Katsumata, T
Konno, M
Murakami, H
机构
[1] Tokyo Metropolitan Coll Aeronaut Engn, Dept Elect Technol, Arakawa Ku, Tokyo 1160003, Japan
[2] Tokyo Metropolitan Inst Technol, Fac Engn, Tokyo 1910065, Japan
[3] Otsuma Womens Univ, Dept Social Informat Studies, Tokyo 2060035, Japan
关键词
Cu film; large crystals; spiral growth of crystals; plasma irradiation; qualitative analysis;
D O I
10.1143/JJAP.37.4510
中图分类号
O59 [应用物理学];
学科分类号
摘要
Large studded crystals grown rapidly with spiral grooves on Cu film surfaces were observed using a scanning electron microscope after irradiation of a glow discharge plasma. Adsorption on and penetration into the Cu film of ions and neutral gases produced in the glow discharge plasma were confirmed by qualitative analysis using a scanning Anger spectrometer. The mechanism of crystal growth was clarified by considering adsorption and penetration of ions such as N-2(+), O-2(+), CO+ and O-2(-), and by considering the movement of Cu+ ions inside the Cu film, under the influence of focal electric fields between positive ions and electrons and between positive and negative ions.
引用
收藏
页码:4510 / 4514
页数:5
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