Formation of plasma and ion flux on a target, irradiated by an intense electron beam

被引:10
|
作者
Engelko, V [1 ]
Mueller, G
机构
[1] DV Efremov Sci Res Inst Electrophys Apparatus, St Petersburg 189631, Russia
[2] Forschungszentrum Karlsruhe, IHM, D-76021 Karlsruhe, Germany
关键词
D O I
10.1063/1.1944217
中图分类号
O59 [应用物理学];
学科分类号
摘要
Theoretical consideration shows that under the influence of an intense electron beam, first, an ion flux and then plasma are formed on the surface of a target. The target plasma is created when the density of the ion flux achieves a certain limiting value. The time necessary for the plasma formation depends on the beam current density and the efficiency of gas desorption and ionization. This time is few microseconds under typical vacuum conditions of about 5.0 X 10(-5) mbar, electron-beam current density in the range of 10 A/cm(2), and kinetic energy of electrons in the range of 100 keV. When the density of the ion flux reaches a limiting value the beam potential decreases to a level, which is half of the initial one. A transient layer is formed between the plasma boundary and the electron beam. For conditions mentioned above its length are few centimeters. The target plasma expands into the beam drift region, with a velocity increasing in time. The expansion of the target plasma is the main reason for neutralization of the electron-beam space charge. (c) 2005 American Institute of Physics.
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页数:7
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