Low-temperature growth of single-walled carbon nanotubes by water plasma chemical vapor deposition

被引:69
|
作者
Min, YS [1 ]
Bae, EJ [1 ]
Oh, BS [1 ]
Kang, D [1 ]
Park, W [1 ]
机构
[1] Samsung Adv Inst Technol, Mat & Devices Res Ctr, Yongin 449712, Kyeongki, South Korea
关键词
D O I
10.1021/ja054108w
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Preferential growth of pure single-walled carbon nanotubes (SWNTs) over multi-walled carbon nanotubes (MWNTs) was demonstrated at low temperature by water plasma chemical vapor deposition. Water plasma lowered the growth temperature down to 450 °C, and the grown nanotubes were single-walled without carbonaceous impurities and MWNTs. The preferential growth of pure SWNTs over MWNTs was proven with micro-Raman spectroscopy, high-resolution transmission electron microscopy, and electrical characterization of the grown nanotube networks. Copyright © 2005 American Chemical Society.
引用
收藏
页码:12498 / 12499
页数:2
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