Contact pressure measurement using silicon-based AlxGa1-xAs semiconductor pressure sensors

被引:0
|
作者
Tun, TN
Lok, TS
Jui, TC
Akkipeddi, R
Rahman, A
机构
[1] Natl Univ Singapore, Dept Mech Engn, Singapore 117576, Singapore
[2] Natl Univ Singapore, Div Bioengn, Singapore 117576, Singapore
[3] Natl Univ Singapore, Inst Mat Res & Engn, Singapore 117576, Singapore
关键词
semiconductor; silicon; pressure sensors;
D O I
10.1016/j.sna.2004.07.012
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Various types of pressure sensors are widely used in manufacturing, defence, medical and precision industries. Most of these sensors are, p based on either piezoelectric or piezoresistive mechanism for sensing applications. Piezoelectric pressure sensors are not suited for measuring static pressure mainly due to leakage of electric charges under constant pressure. Surface micromachined silicon pressure sensors, based on piezoresistive mechanism, are reliable with satisfactory pressure sensitivity. However, the use of mechanical diaphragm limits the performance of the sensor due to its slow response time when a pressure is applied. The measurable pressure by silicon pressure sensor is also low (mostly in kPa range) and is not suitable for high contact pressure measurement (MPa in range). This paper reports the fabrication and testing of pressure sensitive silicon-based AlxGa1-xAs pressure sensors, which are suitable for both static and dynamic pressure measurements with a wide range of applied pressure. The pressure sensors are fabricated based on two different kinds of substrates, silicon and GaAs, and tested under various conditions. Contact pressure sensitivity, linearity, hydrostatic pressure sensitivity, hysteresis, temperature sensitivity and long-time stability (creep) test results for these two types of the fabricated pressure sensors have been compared and presented in this paper. (C) 2004 Published by Elsevier B.V.
引用
收藏
页码:190 / 201
页数:12
相关论文
共 50 条
  • [1] AlxGa1-xAs semiconductor sensor for contact pressure measurement
    Toh, SL
    Tay, CJ
    Ng, SH
    Rahman, M
    SENSORS AND ACTUATORS A-PHYSICAL, 2000, 79 (01) : 31 - 35
  • [2] PRESSURE SENSORS BASED ON VARIABLE-GAP ALXGA1-XAS
    BARTASHEVICH, ZN
    KAVALYAUSKAS, AA
    SHIMULITE, EA
    INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, 1977, 20 (05) : 1479 - 1481
  • [3] GROWTH OF ALXGA1-XAS BY REDUCED PRESSURE MOVPE USING TRIMETHYLAMINE ALANE
    JONES, AC
    RUSHWORTH, SA
    BOHLING, DA
    MUHR, GT
    JOURNAL OF CRYSTAL GROWTH, 1990, 106 (2-3) : 246 - 252
  • [4] Pressure and composition effects on the gap properties of AlxGa1-xAs
    1600, American Inst of Physics, Woodbury, NY, USA (74):
  • [5] PRESSURE-DEPENDENCE OF TRANSPORT PROPERTIES IN ALXGA1-XAS
    LIFSHITZ, N
    JAYARAMAN, A
    LOGAN, RA
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1979, 24 (03): : 318 - 318
  • [6] Pressure dependence of the optic phonon energies in AlxGa1-xAs
    Holtz, M
    Seon, M
    Brafman, O
    Manor, R
    Fekete, D
    PHYSICAL REVIEW B, 1996, 54 (12) : 8714 - 8720
  • [7] PRESSURE AND COMPOSITION EFFECTS ON THE GAP PROPERTIES OF ALXGA1-XAS
    CAPAZ, RB
    DEARAUJO, GC
    KOILLER, B
    VONDERWEID, JP
    JOURNAL OF APPLIED PHYSICS, 1993, 74 (09) : 5531 - 5537
  • [8] TE DOPING OF GAAS AND ALXGA1-XAS USING DIETHYLTELLURIUM IN LOW-PRESSURE OMVPE
    HOUNG, YM
    LOW, TS
    JOURNAL OF CRYSTAL GROWTH, 1986, 77 (1-3) : 272 - 280
  • [9] TEMPERATURE-COEFFICIENT OF RESISTANCE OF PRESSURE SENSORS MADE FROM VARIABLE-GAP ALXGA1-XAS
    BARTASHEVICH, ZN
    SHIMULITE, EA
    INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, 1977, 20 (05) : 1482 - 1484
  • [10] Electron mobility for a model AlxGa1-xAs/GaAs heterojunction under pressure
    Bai, X. P.
    Ban, S. L.
    EUROPEAN PHYSICAL JOURNAL B, 2007, 58 (01): : 31 - 36