Developments in glow discharge optical emission spectrometry

被引:15
|
作者
Bengtson, A
机构
[1] Swed. Institute for Metals Research, S-11428 Stockholm
关键词
glow discharge; optical emission spectrometry; depth profiling; precision; detection limit; quantification; background;
D O I
10.1039/ja9961100829
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
The historical background of glow discharge optical emission spectroscopy (GD-OES) is briefly discussed. The Grimm-type source is described, including some of the unique analytical characteristics. State-of-the-art analytical figures of merit for hulk analysis are RSD 0.1-1% for major and minor analytes and detection limits in the range 1-10 ppm. For surface and depth profile analysis, GD-OES is a technique with the capability of profiling 100 mu m thick surface layers, yet the minimum information depth is just 1 mm. Recent developments in methods for the quantification of depth profiles are presented. The current trends in the development of new glow discharge sources is discussed, with emphasis on rf technology for non-conducting materials. Some speculations regarding future trends in the technical development of GD-OES are given. It is argued that pulsed operation in combination with time-resolved detection should be utilized in order to improve further the analytical figures of merit.
引用
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页码:829 / 833
页数:5
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