Laser annealing of ferroelectric thin films

被引：0
|
作者：
Lebo, I. G. [1 ]
Kudryashov, S. I. [2 ]
Vorotilov, K. A. [1 ]
Sigov, A. S. [1 ]
Zhigalina, O. M. [3 ]
Zhitkova, O. A. [1 ]
Zvorykin, V. D. [2 ]
机构：
[1] Tech Univ, Moscow State Inst Radioengn Elect & Automat, Prospect Vernadskogo 78, Moscow 119454, Russia
[2] RAS, Lebedev Phys Inst, Moscow 119991, Russia
[3] Russian Acad Sci, Inst Crystallog, Moscow 117333, Russia
来源：
INTERNATIONAL CONFERENCE ON LASERS, APPLICATIONS, AND TECHNOLOGIES 2007: LASER-ASSISTED MICRO- AND NANOTECHNOLOGIES | 2007年 / 6732卷
关键词：
D O I：
10.1117/12.751914
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
experimental and numerical investigations of laser annealing of thin ferroelectric heterostructures have been presented in this paper. Laser annealing of thin films has been made in KrF laser facilities (Lebedev Phys. Institute, Moscow). 2D numerical code "TEPOL" have been developed for modeling of physical processes in multilayer samples. Xray structural analysis and e-beam microscopy have been used to research the samples. The laser heating leads to partial crystallization of film and considerable change metal system in compare with traditional heat treating. A new approach to the study of samples with help of photo-acoustic method has been discussed in the paper.
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页数：9
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