Energetic deposition and surface characterization of thin carbon films on nickel

被引:0
|
作者
Adhi, KP [1 ]
Sharma, AK [1 ]
Wagal, SS [1 ]
Joag, DS [1 ]
Kulkarni, SK [1 ]
机构
[1] Univ Poona, Dept Phys, Ctr Adv Studies Mat Sci & Solid State Phys, Poona 411007, Maharashtra, India
来源
MODERN PHYSICS LETTERS B | 1998年 / 12卷 / 10期
关键词
D O I
10.1142/S0217984998000470
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thin films deposited by rapidly quenching the energetic carbon species impinging onto polycrystalline nickel substrates were studied by X-ray photoelectron spectroscopy (XPS), electron energy loss spectroscopy (EELS), and field ion microscopy (FIM). XPS and EELS of the deposited films, when compared with those recorded for graphite and synthetic diamond, indicated the growth of diamond like carbon films and amorphic diamond (a-D) phase. Surface atomic arrangement in the film is observed by FIM which magnifies the surface similar to 10(5) to 10(6) times. Facetting, lack of graphitic ordering, stability of the image inspite of raising or lowering the voltage about the field evaporation voltage indicate that the field ion micrograph is that of a-D.
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页码:383 / 391
页数:9
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