Growth of thin films of molybdenum and tungsten oxides by combustion CVD using aqueous precursor solutions

Using combustion (C) CVD, layers of molybdenum and tungsten oxides have been deposited on glass and silicon at low temperatures. Inexpensive ammonium salts of molybdate and metatungstate ions were used as precursors and were delivered to the coating flame as an aqueous solution using a nebulizer. The resulting films were analyzed by scanning electron microscopy (SEM), energy-dispersive analysis of X-rays (EDAX), Rutherford backscattering (RBS), X-ray photoelectron spectroscopy (XPS), and X-ray diffraction (XRD). These indicated that the films were continuous, moderately smooth, and consisted of amorphous, disordered molybdenum and tungsten trioxides.