The peripheral dose outside the applicator in electron beams of an Elekta linear accelerator

被引:7
|
作者
Haghparast, Abbas [1 ]
Amiri, Fatemeh [2 ]
Yarahmadi, Mehran [3 ]
Rezaei, Mohammad [4 ]
机构
[1] Kermanshah Univ Med Sci, Fac Med, Dept Med Phys, Kermanshah, Iran
[2] Kermanshah Univ Med Sci, Fac Paramed Sci, Dept Radiol, Kermanshah, Iran
[3] Kurdistan Univ Med Sci, Fac Med, Dept Med Phys, Sanandaj, Iran
[4] Kermanshah Univ Med Sci, Sleep Disorders Res Ctr, Kermanshah, Iran
关键词
Electron beam; Peripheral dose; Applicator; Elekta linac; SCATTERED RADIATION; LEAKAGE RADIATION; FIELD DOSIMETRY; ENERGY; LENS; IRRADIATION; CATARACT;
D O I
10.1007/s13246-018-0660-9
中图分类号
R318 [生物医学工程];
学科分类号
0831 ;
摘要
Peripheral doses out of field could have short and long terms biological effects on patients treated with electron beams. In this study, peripheral dose outside the applicator was measured using the 6, 10 and 18 MeV beams of an Elekta synergy linac. For these beams dose profiles were measured using EBT3 film at various depths within a solid water phantom. Measurements were performed using 6 x 6, 10 x 10, 14 x 14 and 20 x 20 cm(2) applicators at gantryangles of 0A degrees, 10A degrees and 20A degrees and depths of 0, 0.5, 1 cm and depth of Dmax (maximum dose) for each energy. The peripheral dose profiles were normalized to the distance of 2 cm from the edge of each field. The largest peak of the peripheral dose was observed for 18 MeV 3 cm from the outer edge of the applicator. Peak dose increased with increasing energy. Peak dose at 18 MeV electron beam was 1.6% at the surface of phantom and at the distance of 2 cm from the outer edge of the applicator when the applicator of 20 x 20 cm(2) was used. Peak dose at 6 MeV electron beam was 1.15% at the same distance in the same applicator size. It was found that the peak dose decreased with increasing depth and increased with increase in field size. Also, the peak dose moved towards CAX with increase in gantry angle.In general dose to tissue out of field could be reduced using appropriate shielding for each applicator and beam energy.
引用
收藏
页码:647 / 655
页数:9
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