Preparation of lithium niobate thin film by thermal chemical vapor deposition

被引：11
|
作者：
Shin, YS
Yoshida, M
Akiyama, Y
Imaishi, N
Jung, SC
机构：
[1] Kyushu Univ, Dept Appl Sci Elect & Mat, Kasuga, Fukuoka 8168580, Japan
[2] Kyushu Univ, Inst Mat Sci & Engn, Kasuga, Fukuoka 8168580, Japan
[3] Sunchon Natl Univ, Dept Environm Engn, Sunchon 540742, Chonnam, South Korea
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2003年 / 42卷 / 08期
关键词：
lithium niobate; lithium oxide; niobium oxide; CVD; polycrystal line; thin films;
D O I：
10.1143/JJAP.42.5227
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Polycrystalline LiNbO3 films were prepared using the metalorganic compounds, Li(DPM) and Nb(OC2H5)(5), by thermal chemical vapor deposition at 5 Torr in the temperature range of 873-1023 K. The range of operation conditions for pure LiNbO3 growth using Nb(OC2H5)(5) is wider than that using Nb(DPM)(2)Cl-3 as the Nb source. The distribution of growth rate in the reactor and that of step coverage in chemical-vapor-deposited LiNbO3 are governed by the Nb2O5 growth process, and the reactivity of Nb(OEt)(5) is considerably higher than that of Nb(DPM)(2)Cl-3.
引用
收藏
页码：5227 / 5232
页数：6
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