Ferromagnetic Anomalous Hall Effect in Cr-Doped Bi2Se3 Thin Films via Surface-State Engineering

被引:13
|
作者
Moon, Jisoo [1 ]
Kim, Jinwoong [1 ]
Koirala, Nikesh [1 ,3 ]
Salehi, Maryam [2 ]
Vanderbilt, David [1 ]
Oh, Seongshik [1 ]
机构
[1] Rutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
[2] Rutgers State Univ, Dept Mat Sci & Engn, Piscataway, NJ 08854 USA
[3] MIT, Dept Phys, Cambridge, MA 02139 USA
基金
美国国家科学基金会;
关键词
Topological insulator; Bi2Se3; anomalous Hall effect; ferromagnetism; Chern number; TOPOLOGICAL INSULATOR; PHASE-TRANSITION; REALIZATION;
D O I
10.1021/acs.nanolett.8b03745
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The anomalous Hall effect (AHE) is a nonlinear Hall effect appearing in magnetic conductors, boosted by internal magnetism beyond what is expected from the ordinary Hall effect. With the recent discovery of the quantized version of the AHE, the quantum anomalous Hall effect (QAHE), in Cr- or V-doped topological insulator (TI) (Sb,Bi)(2)Te-3 thin films, the AHE in magnetic TIs has been attracting significant interest. However, one of the puzzles in this system has been that while Cr- or V-doped (Sb,Bi)(2)Te-3 and V-doped Bi2Se3 exhibit AHE, Cr-doped Bi2Se3 has failed to exhibit even ferromagnetic AHE, the expected predecessor to the QAHE, though it is the first material predicted to exhibit the QAHE. Here, we have successfully implemented ferromagnetic AHE in Cr-doped Bi2Se3 thin films by utilizing a surface state engineering scheme. Surprisingly, the observed ferromagnetic AHE in the Cr-doped Bi2Se3 thin films exhibited only a positive slope regardless of the carrier type. We show that this sign problem can be explained by the intrinsic Berry curvature of the system as calculated from a tight-binding model combined with a first-principles method.
引用
收藏
页码:3409 / 3414
页数:6
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