Atomic Layer Deposited TiO2 and Al2O3 Thin Films as Coatings for Aluminum Food Packaging Application

被引:34
|
作者
Dias, Vanessa [1 ,2 ]
Maciel, Homero [1 ,3 ]
Fraga, Mariana [4 ]
Lobo, Anderson O. [5 ]
Pessoa, Rodrigo [1 ,3 ]
Marciano, Fernanda R. [2 ,3 ]
机构
[1] Ctr Ciencia & Tecnol Plasmas & Mat PlasMat, ITA, BR-12228900 Sao Jose Dos Campos, SP, Brazil
[2] Univ Vale Paraiba Univap, Lab Nanotecnol Biomed, BR-12244000 Sao Jose Dos Campos, SP, Brazil
[3] Univ Brasil, Inst Cient & Tecnol, BR-08230030 Sao Paulo, SP, Brazil
[4] Univ Fed Sao Paulo Unifesp, Inst Cient & Tecnol, BR-12231280 Sao Jose Dos Campos, SP, Brazil
[5] Univ Fed Piaui UFPI, LIMAV Lab Interdisciplinar Mat Avancados, BR-64049550 Teresina, PI, Brazil
基金
巴西圣保罗研究基金会;
关键词
corrosion barrier; titanium dioxide; aluminum oxide; atomic layer deposition; linear sweep voltammetry; electrochemical impedance spectroscopy; CORROSION PROTECTION; BARRIER COATINGS; STAINLESS-STEEL; RESISTANCE; OXIDE; TEMPERATURE; ANTICORROSION; BEHAVIOR; COPPER; WATER;
D O I
10.3390/ma12040682
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Titanium dioxide (TiO2) and aluminum oxide (Al2O3) coatings have been investigated in a wide range of bio-applications due to their biodegradation and biocompatibility properties, that are key parameters for their use in the food packaging and biomedical devices fields. The present study evaluates and compares the electrochemical behavior of the non-coated, commercial resin-coated, TiO2-coated and Al2O3-coated aluminum in commercial beer electrolyte. For this, TiO2 and Al2O3 thin films were deposited on aluminum (Al) substrates using atomic layer deposition (ALD). The evaluation of the corrosion barrier layer properties was performed by linear sweep voltammetry (LSV) during 10 min and electrochemical impedance spectroscopy (EIS). In addition, profilometry, grazing incidence X-ray diffractometry (GIXRD), scanning electron microscopy (SEM) and Fourier-transform infrared spectroscopy (FT-IR) analyses were performed to investigate the physical and chemical properties of the pristine and / or corroded samples. TiO2 and Al2O3 films presented an amorphous structure, a morphology that follows Al substrate surface, and a thickness of around 100 nm. Analysis of LSV data showed that ALD coatings promoted a considerable increase in corrosion barrier efficiency being 86.3% for TiO2-coated Al and 80% for Al2O3-coated Al in comparison with 7.1% of commercial resin-coated Al. This is mainly due to the lower electrochemical porosity, 11.4% for TiO2-coated Al and 20.4% for Al2O3-coated Al in comparison with 96% of the resin-coated Al, i.e. an increase of up to twofold in the protection of Al when coated with TiO2 compared to Al2O3. The EIS results allow us to complement the discussions about the reduced corrosion barrier efficiency of the Al2O3 film for beer electrolyte once SEM and FT-IR analyzes did not show drastic changes in both investigated ALD films after the corrosion assays. The above results indicate that ALD TiO2 and Al2O3 films may be a viable alternative to replace the synthetic resin coatings frequently used in aluminum cans of use in the food industry.
引用
收藏
页数:15
相关论文
共 50 条
  • [1] Atomic layer deposition of TiO2 and Al2O3 thin films and nanolaminates
    Mitchell, DRG
    Triani, G
    Attard, DJ
    Finnie, KS
    Evans, PJ
    Barbé, CJ
    Bartlett, JR
    SMART MATERIALS AND STRUCTURES, 2006, 15 (01) : S57 - S64
  • [2] Density and size effects on the thermal conductivity of atomic layer deposited TiO2 and Al2O3 thin films
    DeCoster, Mallory E.
    Meyer, Kelsey E.
    Piercy, Brandon D.
    Gaskins, John T.
    Donovan, Brian F.
    Giri, Ashutosh
    Strnad, Nicholas A.
    Potrepka, Daniel M.
    Wilson, Adam A.
    Losego, Mark D.
    Hopkins, Patrick E.
    THIN SOLID FILMS, 2018, 650 : 71 - 77
  • [3] Tribocorrosion behavior of TiO2/Al2O3 nanolaminate, Al2O3, and TiO2 thin films produced by atomic layer deposition
    Radi, Polyana Alves
    Testoni, Giorgio Ernesto
    Pessoa, Rodrigo Savio
    Maciel, Homero Santiago
    Rocha, Luis Augusto
    Vieira, Lucia
    SURFACE & COATINGS TECHNOLOGY, 2018, 349 : 1077 - 1082
  • [4] Atomic layer deposition (ALD) of TiO2 and Al2O3 thin films on silicon
    Mitchell, DRG
    Triani, G
    Attard, DJ
    Finnie, KS
    Evans, PJ
    Barbé, CJ
    Bartlett, JR
    DEVICE AND PROCESS TECHNOLOGIES FOR MEMS, MICROELECTRONICS, AND PHOTONICS III, 2004, 5276 : 296 - 306
  • [5] TiO2/Al2O3/TiO2 nanolaminated thin films for DRAM capacitor deposited by plasma-enhanced atomic layer deposition
    Jeon, Woojin
    Chung, Hoi-Sung
    Joo, Daekwon
    Kang, Sang-Won
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2008, 11 (02) : H19 - H21
  • [6] Surface modification of thermoplastics by atomic layer deposition of Al2O3 and TiO2 thin films
    Kemell, Marianna
    Farm, Elina
    Ritala, Mikko
    Leskela, Markku
    EUROPEAN POLYMER JOURNAL, 2008, 44 (11) : 3564 - 3570
  • [7] Surface Passivation by Atomic-layer-deposited Al2O3/TiO2 Stacks
    Suh, Dongchul
    Choi, Duk-Yong
    Yu, Jun
    Liang, Wensheng
    Weber, Klaus J.
    2013 IEEE 39TH PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC), 2013, : 1304 - 1306
  • [8] Low-temperature Atomic Layer Deposition of TiO2, Al2O3, and ZnO Thin Films
    Nam, Taewook
    Kim, Jae-Min
    Kim, Min-Kyu
    Kim, Hyungjun
    Kim, Woo-Hee
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2011, 59 (02) : 452 - 457
  • [9] Laser damage properties of TiO2/Al2O3 thin films grown by atomic layer deposition
    Wei, Yaowei
    Liu, Hao
    Sheng, Ouyang
    Liu, Zhichao
    Chen, Songlin
    Yang, Liming
    APPLIED OPTICS, 2011, 50 (24) : 4720 - 4727
  • [10] Investigation of the Corrosion Behavior of Atomic Layer Deposited Al2O3/TiO2 Nanolaminate Thin Films on Copper in 0.1 M NaCl
    Fusco, Michael A.
    Oldham, Christopher J.
    Parsons, Gregory N.
    MATERIALS, 2019, 12 (04)