Loss measurements and stoichiometric dependence of Ti and O implanted LiNbO3 waveguides

被引:2
|
作者
Williams, EK
Ila, D
Sarkisov, S
Venkateswarlu, P
Poker, DB
Hensley, DK
机构
[1] ALABAMA A&M UNIV,CTR IRRADIAT MAT,NORMAL,AL 35762
[2] ALABAMA A&M UNIV,CTR NONLINEAR OPT,NORMAL,AL 35762
[3] OAK RIDGE NATL LAB,DIV SOLID STATE,OAK RIDGE,TN 37831
关键词
D O I
10.1016/S0168-583X(96)00981-0
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Planar waveguides created by the implantation at 500 degrees C of 2.5 x 10(17) Ti ions/cm(2) and 2.5, 5.0 and 7.5 x 10(17) O ions/cm(2) have been characterized for loss by the scattered light and cutback techniques, Results indicate losses of less than 2.5 dB/cm to 3 dB/cm for waveguides with a Ti:O ratio of 1:3 and losses of over 7 dB/cm2 for waveguides with Ti:O ratios of I: 1 and 1:2.
引用
收藏
页码:512 / 514
页数:3
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