Transport phenomena in a high pressure crystal growth system: In situ synthesis for InP melt

The physical phenomena underlying the ''one-step'' in situ synthesis and high pressure growth of indium phosphide crystals are complex. A high resolution computer model based on multizone adaptive grid generation and curvilinear finite volume discretization is used to predict the flow and temperature fields during the synthesis of the InP melt. Simulations are performed for a range of parameters, including Grashof number, crucible rotation, and location of the injector. These parameters affect the gas flow in a high pressure liquid-encapsulated Czochralski (HPLEC) furnace significantly, and have a strong influence on the melt synthesis and its control.