Notable Enhancement of Phase Transition Performance and Luminous Transmittance in VO2 Films via Simple Method of Ar/O Plasma Post-Treatment

被引:7
|
作者
Jin, Jingcheng [1 ,2 ]
Zhang, Dongping [1 ]
Qin, Xiaonan [1 ]
Yang, Yu [1 ]
Huang, Ying [1 ]
Guan, Huan [1 ]
He, Qicong [1 ]
Fan, Ping [1 ]
Lv, Weizhong [3 ]
机构
[1] Shenzhen Univ, Shenzhen Key Lab Adv Thin Films & Applicat, Coll Phys & Energy, Shenzhen 518060, Peoples R China
[2] Shenzhen Univ, Coll Optoelect Engn, Key Lab Optoelect Devices & Syst, Minist Educ & Guangdong Prov, Shenzhen 518060, Peoples R China
[3] Shenzhen Univ, Coll Chem & Environm Engn, Shenzhen 518060, Peoples R China
关键词
vanadium dioxide; post-treatment; plasma irradiation; luminous transmittance; phase transition performance; THIN-FILMS; DEPOSITION; COATINGS;
D O I
10.3390/nano9010102
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Ar/O plasma irradiation is proposed for post-treatment of vanadium dioxide (VO2) films. Oxidation and surface migration were observed in the VO2 films following irradiation. This combined effect leads to an effective stoichiometry refinement and microstructure reconstruction in the interfacial area. A notable improvement in luminous transmittance and an enhancement in phase transition performance of the treated VO2 films were achieved. Compared with that of as-deposited VO2 films, the electrical phase transition amplitude of treated films increased more than two-fold. The relative improvement in luminous transmittance (380-780 nm) is 47.4% (from 25.1% to 37%) and the increase in solar transmittance is 66.9% (from 29.9% to 49.9%), which is comparable to or better than the previous work using anti-reflection (AR) coatings or doping methods. The interfacial boundary state proved to be crucial and Ar/O plasma irradiation offers an effective approach for further refinement of thermochromic VO2 films.
引用
收藏
页数:9
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