Oxidation and accumulation of molecular hydrogen in a beryllium-water system upon radiation thermal treatment

被引：2
|
作者：
Gadzhieva, N. N. [1 ]
Nurmamedova, F. N. [1 ]
机构：
[1] Azerbaijan Natl Acad Sci, Inst Radiat Problems, AZ-1143 Baku, Azerbaijan
来源：
PROTECTION OF METALS AND PHYSICAL CHEMISTRY OF SURFACES | 2012年 / 48卷 / 04期
关键词：
Oxide Film; Beryllium; Molecular Hydrogen; Passivating Oxide Layer; Stretch Vibra Tions;
D O I：
10.1134/S2070205112040065
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
The kinetics of radiation thermal oxidation of beryllium with water vapor and the accumulation of molecular hydrogen in a Be-H2O system at temperatures of 473-673 K under the effect of gamma radiation is studied. The oxidation is shown to proceed according to a parabolic law and be limited by diffusion. A sharp change (by a factor of 16) in the formation rate of molecular hydrogen and an increase in its concentration by an exponent depending on the oxidation degree and defectiveness of beryllium plates is observed and confirmed by AFM images. The activation energies of the formation of hydrogen are estimated as E (a) = 12 and 34 kJ/mol.
引用
收藏
页码：419 / 423
页数：5
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