Excimer laser crystallization of hydrogenated amorphous

被引：0
|
作者：
Dai, YB [1 ]
Xu, ZY [1 ]
Wang, CG [1 ]
Zhang, SQ [1 ]
An, CW [1 ]
Li, XJ [1 ]
Wan, XB [1 ]
Ding, H [1 ]
机构：
[1] HUAZHONG UNIV SCI & TECHNOL,DEPT SOLID STATE ELECT,WUHAN 430074,PEOPLES R CHINA
来源：
LASER PROCESSING OF MATERIALS AND INDUSTRIAL APPLICATIONS | 1996年 / 2888卷
关键词：
excimer laser crystallization; laser irradiation; crystallized films; a-Si:H; p-Si; p-Si thin film transistors;
D O I：
10.1117/12.253126
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：44 / 50
页数：7
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