Temperature dependence of low-frequency noise characteristics in uniaxial tensile strained nMOSFETs

被引:1
|
作者
Huang, Po Chin [1 ]
Chang, Ching Yao [1 ]
Cheng, Osbert [2 ]
Wu, San Lein [3 ]
Chang, Shoou Jinn [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Elect Engn, Inst Microelect, Tainan 70101, Taiwan
[2] United Microelect Corp, Cent R&D Div, Tainan 744, Taiwan
[3] Cheng Shiu Univ, Dept Elect Engn, Kaohsiung 83347, Taiwan
关键词
1/F NOISE; SI; MOBILITY; MODEL;
D O I
10.7567/JJAP.54.100301
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this paper, we report on the low-frequency (1/f) noise characteristics of uniaxial tensile-strained nMOSFETs operated at high temperatures. We observed a small temperature sensitivity of 1/f noise in strained nMOSFETs. This can be attributed to the reduced tunneling attenuation length, suppressed phonon scattering, and increased mobility, which result from the strain-increased band splitting between the low-energy Delta 2 valleys and high-energy Delta 4 valleys. In addition, regardless of temperature, we found that the dominant mechanism of 1/f noise can be appropriately interpreted using the unified model, which incorporates both the carrier fluctuation and the correlated mobility fluctuation. (c) 2015 The Japan Society of Applied Physics
引用
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页数:4
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