Kinetic rules of precipitation of thin films of titanium dioxide from the gas phase containing titanium tetraisopropylate

被引:2
|
作者
Baryshnikova, M. V. [1 ]
Aleksandrov, S. E. [1 ]
Filatov, L. A. [1 ]
Berberov, A. B. [1 ]
机构
[1] St Petersburg State Polytech Univ, St Petersburg 195251, Russia
关键词
ATOMIC LAYER DEPOSITION;
D O I
10.1134/S1070363213080215
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Precipitation of titanium dioxide layers from the gas phase in the reaction system containing titanium tetraisopropylate and oxygen at the total pressure 1 kPa is studied. It is shown that in the range of 300-500A degrees C the precipitation proceeds in the kinetic regime and is accompanied by the formation of layers of monotonous thickness containing nanocrystalline phases of anatase and rutile. In the temperature range 300-350A degrees C the activation energy value was 92.7 kJ mol(-1), and at higher temperatures (up to 500A degrees C) it decreased to 17.5 kJ mol(-1). The increase in the precipitation temperature caused the increase in relative amount of rutile in the precipitated layers.
引用
收藏
页码:1596 / 1600
页数:5
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