Quantitative analysis of a-Si1-xCx:H thin films

The composition of a-Si1-xCx:H films, deposited by magnetron sputtering, was measured by AES (Auger Electron Spectroscopy), RES (Rutherford Backscattering Spectrometry) using both, protons and alpha-particles, ERDA (Elastic Recoil Detection Analysis) and FTIR spectroscopy. The results obtained by all three methods show agreement in C-C/C-Si ratio within the experimental error. However, the AES somewhat underestimates the silicon concentrations, which is discussed as a consequence of chemical bonding and matrix effects. The hydrogen concentrations obtained by ERDA are typically about 30% higher than those estimated by FTIR, possibly due to the presence of non-bonded hydrogen in the film. (C) 1999 Elsevier Science B.V. All rights reserved.