The Effect of Front-Side Silver Metallization on Underlying n+-p Junction in Multicrystalline Silicon Solar Cells

被引:0
|
作者
Jiang, C. -S. [1 ]
Li, Z. G. [2 ]
Moutinho, H. R. [1 ]
Liang, L. [2 ]
Ionkin, A. [2 ]
Al-Jassim, M. M. [1 ]
机构
[1] Natl Renewable Energy Lab, Golden, CO 80401 USA
[2] DuPont Cent Res & Dev, Wilmington, DE 19880 USA
关键词
Crystalline Si; solar cell; silver metallization; p-n junction; scanning Kelvin probe force microscopy; scanning capacitance microscopy; CONTACTS;
D O I
暂无
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
We report on the effect of front-side Ag metallization on the underlying n(+)-p junction of multicrystalline Si solar cells. The junction quality beneath the contacts was investigated by characterizing the uniformities of the electrostatic potential and doping concentration across the junction, using scanning Kelvin probe force microscopy and scanning capacitance microscopy. We investigated cells with a commercial Ag paste (DuPont PV159) and fired at furnace setting temperatures of 800 degrees, 840 degrees, and 930 degrees C, which results in actual cell temperatures similar to 100 degrees C lower than the setting temperature and the three cells being under-, optimal-, and over-fired. We found that the uniformity of the junction beneath the Ag contact was significantly degraded by the over-firing, whereas the junction retained good uniformity with the optimal- and under- fire temperatures. Further, Ag crystallites with widely distributed sizes from <100 nm to several mu m were found at the Ag/Si interface of the over-fired cell. Large crystallites were imaged as protrusions into Si deeper than the junction depth. However, the junction was not broken down; instead, it was reformed on the entire front of the crystaliite/Si interface. We propose a mechanism of the junction-quality degradation, based on emitter Si melting at the temperature around the Ag-Si eutectic point during firing, and subsequent recrystallization with incorporation of impurities in the Ag paste and with formation of crystallographic defects during quenching.
引用
收藏
页码:3365 / 3370
页数:6
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