Impact of technology scaling on metastability performance of CMOS synchronizing latches

被引:9
|
作者
Baghini, MS [1 ]
Desai, MP [1 ]
机构
[1] Indian Inst Technol, EE Dept, Microelectron Grp, Bombay 400076, Maharashtra, India
关键词
D O I
10.1109/ASPDAC.2002.994941
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
In this paper, we use circuit simulations to characterize the effects of technology scaling on the metastability parameters of CMOS latches used as synchronizers. We perform this characterization by obtaining a synchronization error probability curve from a histogram of the latch delay. The main metastability parameters of CMOS latches are tau(m) and T-w. tau(m) is the exponential time constant of the rate of decay of metastability and T-w is effective size of metastability window at a normal propagation delay. Both parameters can be extracted from a histogram of the latch delay. This paper also explains a way to calibrate simulator for enough accuracy. Our simulations indicate that tau(m) scales better than the technology scale factor. T-w also scales down but its factor cannot be well estimated as that of tau(m). This is because T-w is a complex function of signal and clock edge rate and logic threshold level.
引用
收藏
页码:317 / 322
页数:4
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