Electrical characteristics of resistive switching memory with metal oxide nanoparticles on a graphene layer

被引:4
|
作者
Lee, Dong Uk [1 ,2 ]
Kim, Dongwook [1 ,2 ]
Kim, Eun Kyu [1 ,2 ]
Cho, Won-Ju [3 ]
Kim, Young-Ho [4 ]
Im, Hyunsik [5 ]
机构
[1] Hanyang Univ, Dept Phys, Seoul 133791, South Korea
[2] Hanyang Univ, Res Inst Nat Sci, Seoul 133791, South Korea
[3] Kwangwoon Univ, Dept Elect Mat Engn, Seoul 139701, South Korea
[4] Hanyang Univ, Div Mat Sci & Engn, Seoul 133791, South Korea
[5] Dongguk Univ, Dept Semicond Sci, Seoul 100715, South Korea
基金
新加坡国家研究基金会;
关键词
SnO2; Resistance switching; Nonvolatile memory; Polyimide; Graphene; RAMAN-SPECTROSCOPY; TRANSISTORS; POLYIMIDE; GROWTH;
D O I
10.1016/j.tsf.2013.02.111
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A resistive switching memory device with SnO2 nanoparticles embedded in a biphenyl-tertracarboxylic dianhydride-phenylene diamine polyimide layer on single layered graphene (SLG) was demonstrated, and its electrical properties were characterized. Current levels in the resistance switching memory device were controlled by applying pulse voltages of +/- 10 V for 100 ms. The current values of high and low resistance states (HRS and LRS) at 1 V were measured to be about 4.60 x 10(-4) A and 3.04 x 10(-3) A, respectively. The ratio of the HRS and LRS after applying a pulse bias of +/- 10 V appeared to be about 7.9 at 1 V, and this result was retained after 10(4) s. The resistance switching may originate from carrier charging and recombination effects into the SnO2 nanoparticles through modulation of the Fermi level of the SLG due to the applied bias. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:106 / 109
页数:4
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