Electron beam-induced formation of nanosized α-Fe crystals

被引:14
|
作者
Zhang, W
Shimojo, M
Takeguchi, M
Furuya, K
机构
[1] Natl Inst Mat Sci, High Voltage Electron Microscopy Stn, Tsukuba, Ibaraki 3050003, Japan
[2] Tokyo Inst Technol, Precis & Intelligence Lab, Yokohama, Kanagawa 2268503, Japan
关键词
D O I
10.1007/s10853-006-7783-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Focused electron beam induced chemical vapor deposition was performed in a scanning electron microscope with a field emission gun using a precursor of iron carbonyl. Due to the longer deposition time and higher gas pressure than those of our previous electron beam-induced deposition method, a new type of deposition occurred. A large amount of nanosized crystals were produced around the focused beam irradiation point on a carbon substrate at room temperature. The nanocrystals were systematically characterized using transmission electron microscopy with electron energy loss spectroscopy (EELS), and were identified to be single crystals of alpha-Fe. (c) 2006 Springer Science + Business Media, Inc.
引用
收藏
页码:2577 / 2580
页数:4
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