Fabrication large area photonic crystals with periodic waveguide by one-step holographic lithography based on spatial light modulator

A one-step introduction of functional defects into a photonic crystal (PC) is demonstrated. By using a multi-beam phase-controlled holographic lithography and a diffracting optical element, large area one dimensional (1D) and two dimensional (2D) PCs with periodic waveguide were fabricated. The uniform area is up to 4 mm(2), and tens of waveguide have been introduced in the one dimension and two dimension PC structure. This technique gives rise to a substantial reduction of the fabrication complexity and a significant improvement on the accuracy of the functional defects in photonic crystals. This method can also been used to design and fabricate metamaterials.