Instrumented indentation testing to develop hardness and elastic modulus of thin films based on silsesquioxane.

被引：0
|
作者：
Hu, LJ [1 ]
Zhao, SS [1 ]
机构：
[1] Harbin Inst Technol, Dept Astronaut & Mech, Nangang, Peoples R China
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2005年 / 229卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
232-orgn
引用
收藏
页码：U361 / U361
页数：1
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