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- [4] Evaluation of hafnium contamination on wafer surfaces after the wet cleaning process ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES XI, 2013, 195 : 265 - +
- [6] Application of Single-Wafer Wet Cleaning Prior to Epitaxial SiGe Process ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES IX: UCPSS 2008-9TH INTERNATIONAL SYMPOSIUM ON ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES (UCPSS), 2009, 145-146 : 173 - +
- [7] Optimization Design and Flow Field Characteristics Study of Cleaning Process Tank for Wafer Wet 2024 25TH INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING TECHNOLOGY, ICEPT, 2024,
- [10] Elucidation of an isopropyl alcohol (IPA) adsorption phenomenon on a wafer surface for achieving an ultra-clean and IPA-saving drying process in the batch cleaning system ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES X, 2012, 187 : 79 - +