Current Conduction Model for Oxide-Based Resistive Random Access Memory Verified by Low-Frequency Noise Analysis

被引:17
|
作者
Fang, Z. [1 ]
Yu, H. Y. [2 ]
Fan, W. J. [3 ]
Ghibaudo, G. [4 ]
Buckley, J. [5 ]
DeSalvo, B. [5 ]
Li, X. [1 ]
Wang, X. P. [1 ]
Lo, G. Q. [1 ]
Kwong, D. L. [1 ]
机构
[1] ASTAR, Inst Microelect, Singapore 117685, Singapore
[2] South Univ Sci & Technol China, Shenzhen 518055, Peoples R China
[3] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore
[4] MINATEC, Inst Microelect Electromagnetisme & Photon, CNRS, F-38016 Grenoble, France
[5] MINATEC, Commiss Energie Atom, Lab Elect Technol Informat, F-38054 Grenoble, France
关键词
Current conduction model; low-frequency noise (LFN); resistive switching;
D O I
10.1109/TED.2013.2240457
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A conduction model consisting of two parallel resistances from a highly conductive filament region and a uniform leakage oxide region is proposed in this brief to represent the current conduction in the filament-type switching resistive random access memory cell. Low-frequency noise analysis of current fluctuation at different resistance states has been employed to verify its efficiency. It is found that, in the low-resistance regime, filament resistance dominates current conduction and noise varies as a power law of resistance, whereas in the high-resistance regime, uniform oxide leakage is the major source of conduction, giving rise to a nearly constant noise level.
引用
收藏
页码:1272 / 1275
页数:4
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