An analysis of dynamic roughening and smoothening mechanisms of thin films grown with pulsed-dc magnetron sputtering is presented. The roughness evolution has been described by a linear stochastic equation, which contains the second- and fourth-order gradient terms. Dynamic smoothening of the growing interface is explained by ballistic effects resulting from impingements of ions to the growing thin film. These ballistic effects are sensitive to the flux and energy of impinging ions. The predictions of the model are compared with experimental data, and it is concluded that the thin film roughness can be further controlled by adjusting waveform, frequency, and width of dc pulses. (C) 2009 American Institute of Physics. [DOI: 10.1063/1.3037237]
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Univ Kentucky, Lexington, KY 40506 USA
Tru Vue Inc, Mccook, IL 60525 USAUniv Kentucky, Lexington, KY 40506 USA
Kanniah, Vinod
Grulke, Eric A.
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Univ Kentucky, Lexington, KY 40506 USAUniv Kentucky, Lexington, KY 40506 USA
Grulke, Eric A.
Druffel, Thad
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Vis Dynam LLC, Louisville, KY 40299 USA
Univ Louisville, Conn Ctr Renewable Energy Res, Louisville, KY 40292 USAUniv Kentucky, Lexington, KY 40506 USA
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Department of Physics, Beijing Normal UniversityDepartment of Physics, Beijing Normal University
HongKang Song
Ke Xia
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Department of Physics, Beijing Normal UniversityDepartment of Physics, Beijing Normal University
Ke Xia
Jiang Xiao
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Department of Physics and State Key Laboratory of Surface Physics, Fudan University
Collaborative Innovation Center of Advanced MicrostructuresDepartment of Physics, Beijing Normal University