Structural Properties of ZnO/SnO2-Composite-Nanorod Deposited Using Thermal Chemical Vapour Deposition
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作者:
Sin, N. D. Md
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Univ Teknol MARA UiTM, NANOelecT Ctr, Fac Elect Engn, Shah Alam 40450, Selangor, Malaysia
Univ Teknol MARA Cawangan Johor, Fak Kejuruteraan Elekt, Masai 81750, Johor, MalaysiaUniv Teknol MARA UiTM, NANOelecT Ctr, Fac Elect Engn, Shah Alam 40450, Selangor, Malaysia
Sin, N. D. Md
[1
,3
]
Shafura, A. K.
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Univ Teknol MARA UiTM, NANOelecT Ctr, Fac Elect Engn, Shah Alam 40450, Selangor, MalaysiaUniv Teknol MARA UiTM, NANOelecT Ctr, Fac Elect Engn, Shah Alam 40450, Selangor, Malaysia
Shafura, A. K.
[1
]
Malek, M. F.
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Univ Teknol MARA UiTM, NANOelecT Ctr, Fac Elect Engn, Shah Alam 40450, Selangor, MalaysiaUniv Teknol MARA UiTM, NANOelecT Ctr, Fac Elect Engn, Shah Alam 40450, Selangor, Malaysia
Malek, M. F.
[1
]
Mamat, M. H.
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Univ Teknol MARA UiTM, NANOelecT Ctr, Fac Elect Engn, Shah Alam 40450, Selangor, MalaysiaUniv Teknol MARA UiTM, NANOelecT Ctr, Fac Elect Engn, Shah Alam 40450, Selangor, Malaysia
Mamat, M. H.
[1
]
Rusop, M.
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Univ Teknol MARA UiTM, NANOelecT Ctr, Fac Elect Engn, Shah Alam 40450, Selangor, Malaysia
Univ Teknol MARA UiTM, NANOsciTech Ctr NST, Inst Sci IOS, Shah Alam 40450, Selangor, MalaysiaUniv Teknol MARA UiTM, NANOelecT Ctr, Fac Elect Engn, Shah Alam 40450, Selangor, Malaysia
Rusop, M.
[1
,2
]
机构:
[1] Univ Teknol MARA UiTM, NANOelecT Ctr, Fac Elect Engn, Shah Alam 40450, Selangor, Malaysia
[2] Univ Teknol MARA UiTM, NANOsciTech Ctr NST, Inst Sci IOS, Shah Alam 40450, Selangor, Malaysia
[3] Univ Teknol MARA Cawangan Johor, Fak Kejuruteraan Elekt, Masai 81750, Johor, Malaysia
In this work, we report on the effect of substrate temperatures on ZnO/SnO2 composite nanorods deposited by thermal chemical vapour deposition (CVD) onto a ZnO template layer. The substrate temperature varied from 200 similar to 600 degrees C. The FESEM image reveals that the size of the thin film created by the ZnO/SnO2 composite nanorods decreased as the substrate temperature increased.
机构:
Univ Teknol MARA Cawangan Johor, Fak Kejuruteraan Elekt, Masai 81750, Johor, Malaysia
Univ Teknol MARA UiTM, NANOElecT Ctr, Fac Elect Engn, Shah Alam 40450, Selangor, MalaysiaUniv Teknol MARA Cawangan Johor, Fak Kejuruteraan Elekt, Masai 81750, Johor, Malaysia
Sin, N. D. Md
Shafura, A. K.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Teknol MARA UiTM, NANOElecT Ctr, Fac Elect Engn, Shah Alam 40450, Selangor, MalaysiaUniv Teknol MARA Cawangan Johor, Fak Kejuruteraan Elekt, Masai 81750, Johor, Malaysia
Shafura, A. K.
Malek, M. F.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Teknol MARA UiTM, NANOElecT Ctr, Fac Elect Engn, Shah Alam 40450, Selangor, MalaysiaUniv Teknol MARA Cawangan Johor, Fak Kejuruteraan Elekt, Masai 81750, Johor, Malaysia
Malek, M. F.
Mamat, M. H.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Teknol MARA UiTM, NANOElecT Ctr, Fac Elect Engn, Shah Alam 40450, Selangor, MalaysiaUniv Teknol MARA Cawangan Johor, Fak Kejuruteraan Elekt, Masai 81750, Johor, Malaysia
Mamat, M. H.
Rusop, M.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Teknol MARA UiTM, NANOElecT Ctr, Fac Elect Engn, Shah Alam 40450, Selangor, Malaysia
Univ Teknol MARA UiTM, Inst Sci IOS, NANOSciTech Ctr NST, Shah Alam 40450, Selangor, MalaysiaUniv Teknol MARA Cawangan Johor, Fak Kejuruteraan Elekt, Masai 81750, Johor, Malaysia
机构:
USTHB, Fac Phys, BP 32, El Alia Alger, Algeria
Unit Dev Technol, Labs Cellules Photovoltaiques, Algiers 16200, AlgeriaUSTHB, Fac Phys, BP 32, El Alia Alger, Algeria
Sali, S.
Tala-Ighil, R.
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机构:
Unit Dev Technol, Labs Cellules Photovoltaiques, Algiers 16200, AlgeriaUSTHB, Fac Phys, BP 32, El Alia Alger, Algeria
Tala-Ighil, R.
Kermadi, S.
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机构:
Unit Dev Technol, Labs Cellules Photovoltaiques, Algiers 16200, AlgeriaUSTHB, Fac Phys, BP 32, El Alia Alger, Algeria
Kermadi, S.
Boumaour, M.
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机构:
Unit Dev Technol, Labs Cellules Photovoltaiques, Algiers 16200, AlgeriaUSTHB, Fac Phys, BP 32, El Alia Alger, Algeria
Boumaour, M.
Kechouane, M.
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机构:
USTHB, Fac Phys, BP 32, El Alia Alger, AlgeriaUSTHB, Fac Phys, BP 32, El Alia Alger, Algeria
Kechouane, M.
THIN FILMS AND POROUS MATERIALS,
2009,
609
: 111
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