Fabrication of InP-based two-dimensional photonic crystal membrane

被引：19

作者：

Xing, A ^{[1
]}

Davanco, M ^{[1
]}

Blumenthal, DJ ^{[1
]}

Hu, EL ^{[1
]}

机构：

[1] Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2004年 / 22卷 / 01期

关键词：

D O I：

10.1116/1.1635848

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The fabrication process of a InP-based two-dimensional photonic crystal membrane structure is developed. The process includes a well-calibrated electron-beam (e-beam) lithography and InGaAsP/InP etching using methane-hydrogen-argon reactive ion etching. The photonic crystal blocks with ten rows of a hexagonal array of holes with various lattice constants and filling factors are successfully fabricated and characterized by optical transmission measurement. The sensitivity of the band gap to the systematic fabrication error is determined. (C) 2004 American Vacuum Society.

引用

页码：70 / 73

页数：4

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