Harmonic generation in ZnO nanocrystalline laser deposited thin films

被引：23
|
作者：
Narayanan, V [1 ]
Thareja, RK [1 ]
机构：
[1] Indian Inst Technol, Dept Phys, Kanpur 208016, Uttar Pradesh, India
来源：
OPTICS COMMUNICATIONS | 2006年 / 260卷 / 01期
关键词：
pulsed laser deposition; thin film; ZnO; third harmonic;
D O I：
10.1016/j.optcom.2005.09.073
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
ZnO plasma produced by third harmonic 355 rim of Nd:YAG laser at various ambient pressures of oxygen was used for depositing quality nanocrystalline ZnO thin films. Time and space resolved optical emission spectroscopy is used to correlate the plasma properties with that of deposited thin films. The deposited films showed particle size of 8 and 84 nm at ambient oxygen pressure of 100 and 900 mTorr, respectively. Third harmonic generation observed in ZnO thin films deposited under 100 mTorr of ambient oxygen is reported. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：170 / 174
页数：5
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