Removal of silicon from waste HF solution for glass cleaning

被引：0

作者：

Park, HC ^{[1
]}

Kim, KH ^{[1
]}

Ryu, BK ^{[1
]}

Park, SS ^{[1
]}

Shin, HG ^{[1
]}

机构：

[1] Pusan Natl Univ, Dept Inorgan Mat Engn, Pusan 609735, South Korea

来源：

ENVIRONMENTAL ISSUES AND WASTE MANAGEMENT TECHNOLOGIES IN THE CERAMIC AND NUCLEAR INDUSTRIES IV | 1999年 / 93卷

关键词：

D O I：

暂无

中图分类号：

X [环境科学、安全科学];

学科分类号：

08 ; 0830 ;

摘要：

The process for removal of silicon from waste HF solution contaminated by HF attack of TV panel glass was described for use in cleaning of the glass. The removal of silicon was carried out by mixing HF solution containing silicon fluoride ion with sodium carbonate, whereby sodium silico-fluoride precipitated. This process made it possible to reuse the waste HF solution for cleaning of the glass. In an industrial practice, the process was applied and resulted in 90 similar to 95wt% silicon removal at reasonable cost.

引用

页码：43 / 49

页数：7

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