Effect of film thickness on preferred growth of TiN films during filtered arc deposition

被引：5
|
作者：
Zhao, JP
Wang, X
Chen, ZY
Yang, SQ
Shi, TS
Liu, X
机构：
[1] Ion Beam Laboratory, Shanghai Institute of Metallurgy, Chinese Academy of Sciences
来源：
JOURNAL OF MATERIALS SCIENCE LETTERS | 1997年 / 16卷 / 12期
关键词：
D O I：
10.1023/A:1018529314358
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：974 / 976
页数：3
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