Characteristics of ZnO/Al/ZnO multilayers on glass with different ZnO film thicknesses prepared by cathodic vacuum arc deposition

In this paper, the characteristics of the transparent ZnO/Al(10 nm)/ZnO multilayered films on glass substrate with different ZnO film thickness (50, 100, 150 and 200 nm) were investigated. The ZnO films were deposited using cathodic arc plasma technique at a low temperature (<75 degrees C). Microstructure, optical and electrical properties were investigated and discussed. The multilayered films showed a high orientation of (002) peak. An average transmittance around 70 % in the visible region and the lowest resistivity around 4.02x10(-4) Omega-cm could be achieved for the ZnO(50 nm)/Al(10 nm)/ZnO (50 nm) multilayered film.